Alcatel Vacuum Technology A Recognized Leader in Deep Plasma Etching

摘要：

@@ Its first equipment based on a Alcatel patented Inductive Coupled Plasma (ICP) source, with independent source power and substrate bias control for deep etching of silicon was launched in 1993. The exponential growth potential of the MEMS (Micro Electro Mechanical Systems) industry gave birth to the Micro Machining Systems business group (MMS) in 1994.

机标关键词：Plasma Etching、Mechanical Systems、growth potential、Micro Machining、substrate bias、source power

所属期刊栏目：34

分类号：TS1;TN3

在线出版日期：2005-03-17（万方平台首次上网日期，不代表论文的发表时间）

页数：共3页

页码：76-78